Conference: "Raman spectro-microscopy techniques for LFoundry activities"
Raman spectroscopy is an exciting new characterization technique that is receiving a lot of attention in the last few years. It is a complement of Fourier-transform infrared spectroscopy (FTIR) characterization, both in capabilities and in constrains. Thanks to the opportunities offered by the open lab policy pursued by LFoundry in recent years the Physical & FA Lab team started to research characterization opportunities for LF applications. In this workshop it is summarized more than three years of work by two Ma. Students in Engineering and Chemistry and one PhD Student in Physics. Various applications are shown both for a) crystalline silicon characterization, namely the measurement of doping and annealing after Source/Drain implantations and b) for poly-silicon grown for SPARC PowerMos applications (doping and annealing). The roadmap for future work with this technique will be presented to all people for feedback on opportunities for LFoundry.
The speaker is Stefano Palleschi that in conclusion of his 18 month PhD stage assignment in LFoundry will summarize the results of his work.